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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 210-212Cavity Formation in Helium-Implanted Silicon -...

Cavity Formation in Helium-Implanted Silicon - Temperature Dependence

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Defects and Diffusion in Semiconductors V

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Periodical:

Defect and Diffusion Forum (Volumes 210-212)

Pages:

37-42

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.210-212.37

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Online since:

November 2002

Authors:

Jean François Barbot, Erwan Oliviero, Marie-Laure David, Sophie Rousselet, Marie France Beaufort, A. van Veen

Keywords:

Cavities, Electron Microscopy, Helium Implantation, Silicon, Thermal Desorption

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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