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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vol. 264Diffusion of Implanted Metals in Tantalum Silicide

Diffusion of Implanted Metals in Tantalum Silicide

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Diffusion and Stresses

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Periodical:

Defect and Diffusion Forum (Volume 264)

Pages:

151-154

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.264.151

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Online since:

April 2007

Authors:

F. Salman, Peng Zhang, Fred A. Stevie, Lee Chow

Keywords:

Diffusion, Ion Implantation, Silicide, SIMS

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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