[1]
Z. Li, B. Rajendran, T. I. Kamins, X. Li, Y. Chen, R. Stanley Williams, Silicon nanowires for sequence-specific DNA sensing: device fabrication and simulation, Appl. Phys. A: Materials Science & Processing, 80 (2005) 1258-1263.
DOI: 10.1007/s00339-004-3157-1
Google Scholar
[2]
I. Park, Z. Li, A. P. Pisano, and R. S. Williams, Top-down fabricated silicon nanowire sensor for real-time chemical detection, Nanotechnology, 21 (2010) 015501.
DOI: 10.1088/0957-4484/21/1/015501
Google Scholar
[3]
O. V. Naumova, B. I. Fomin, D. A. Nasimov, N. V. Dudchenko, S. F. Devyatova, E. D. Zhanaev, V. P. Popov, A. V. Latyshev, A. L. Aseev, Yu. D. Ivanov and A. I. Archakov, SOI nanowires as sensors for charge detection, Semicond. Sci. Technol. 25, (2010).
DOI: 10.1088/0268-1242/25/5/055004
Google Scholar
[4]
E. Stern, J. F. Klemic, D. A. Routenberg, P. N. Wyrembak and D. B. Turner-Evans, Label-free immunedetection with CMOS-compatible semiconducting nanowires, Nature, 445 (2007) 519-522.
DOI: 10.1038/nature05498
Google Scholar
[5]
O. V. Naumova, V. P. Popov, L. N. Safronov, B. I. Fomin, D. A. Nasimov, A. V. Latyshev, A. L. Aseev, Yu. D. Ivanov and A. I. Archakov, Ultra-Thin SOI Layer Nanostructuring and Nanowire Transistor Formation for FemtoMole Electronic Biosensors, ESC Transactions, 25 (2009).
DOI: 10.1149/1.3241580
Google Scholar
[6]
E. Stern, A. Vacic, N. K. Rajan, J. M. Criscione, J. Park, B. R. Ilic, D. J. Mooney, M. A. Reed and T. M. Fahmy, Label-free biomarker detection from whole blood, Nature Nanotechnology, 5 (2009) 138-142.
DOI: 10.1038/nnano.2009.353
Google Scholar
[7]
W. Den, H. Bai, and Y. Kang, Organic Airborne Molecular Contamination in Semiconductor Fabrication Clean Rooms, J. Electrochem. Soc., 153 (2006) G149-G159.
DOI: 10.1149/1.2147286
Google Scholar
[8]
K. Saga and T. Hattori, Identification and Removal of Trace Organic Contamination on Silicon Wafers Stored in Plastic Boxes, J. Electrochem. Soc., 143 (1996) 3279 -3284.
DOI: 10.1149/1.1837198
Google Scholar
[9]
F. Sugimoto and S. Okamura, Adsorption Behavior of Organic Contaminants on a Silicon Wafer Surface, J. Electrochem. Soc., 146 (1999) 2725-2729.
DOI: 10.1149/1.1392000
Google Scholar
[10]
E. H. Nicoliannian, J. R. Brews, Metal Oxide Semiconducror Physics and Technology, New York, (1982).
Google Scholar
[11]
C. R. Helms and E. H. Poindexter, The silicon-silicon dioxide system: Its microstructure and imperfections, Rep. Prog. Phys. 57 (1994) 791-852.
DOI: 10.1088/0034-4885/57/8/002
Google Scholar
[12]
Y. H. Ha , S. Kim , S. Y. Lee, J. H. Kim, D. H. Beak, H. K. Kim, and D. W. Moon, Appl. Phys. Lett., 74 (1999) 3510.
Google Scholar
[13]
D. J. Di Maria and J. H. Stathis, Defect production, degradation, and breakdown of silicon dioxide films, J. Appl. Phys., 70 (1991) 1500.
Google Scholar
[15]
A. J. Moulson, J. P. Roberts, The diffusion of water in optical fibers, Trans. Brit. Ceram. Soc. 59 (1960) 388.
Google Scholar