Optimum Annealing Temperature for Transformation of NiO Nanoflakes from Chemically Grown Ni(OH)₂ Nanostructure Thin Film

Abstract:

Nickel oxide nanoflakes have been synthesized by chemical bath deposition. The films have been deposited on ITO/glass substrate and anneal at different temperature in furnace. Surface morphology, structural and optical properties of the nanoflakes films were examined and analysed. FESEM result shows that the NiO/Ni(OH)₂ film shown an increase in the thin film roughness with temperature. The film was formed with the growth of porous net-like structure that was made up of interconnected nanoflakes’ wall with a thickness of 25–45 nm for the as-grown and annealed thin film samples. The atomic ratio and weight of sample treated at 250 °C approaches the stoichiometric value. XRD analysis demonstrated that the NiO nanoflakes consist of a rhombohedral structure with orientation peak of (110), (202) and (211). This appears with more stronger intensity at 250 °C. Likewise the PL and XRD result confirms the absence of Ni(OH)₂ at 250 and 350 °C of annealing temperature. From the results analysis of this work the optimum temperature for synthesizing high stoichiometric and crystalline quality of NiO nanoflakes was consider to be at 250 °C from the characterisation result analysis.

• Periodical: Journal of Nano Research (Volume 49)
• Pages: 75-84
• DOI: https://doi.org/10.4028/www.scientific.net/JNanoR.49.75
• Online since: September 2017
• Authors: Dauda Abubakar*, Naser Mahmoud Ahmed, Shahrom Mahmud, Nabeel Z. Al-Hazeem
• Keywords: Annealling Temperature, Chemical Bath Deposition, Nanoflakes Thin Film, Nickel Oxide

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