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HomeKey Engineering MaterialsKey Engineering Materials Vols. 169-170Fabrication and Characterization of Epitaxial MgO...

Fabrication and Characterization of Epitaxial MgO Thin Films on Si Substrates

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Electroceramics in Japan II

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Periodical:

Key Engineering Materials (Volumes 169-170)

Pages:

167-170

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.169-170.167

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Online since:

June 1999

Authors:

Junji Senzaki, Takanori Ueno

Keywords:

Electrical Properties, Growth Rate, Intermediate Layer, Oxygen Annealing, RF Sputtering

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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