Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties

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Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at = 632.8 nm, which is close to that of bulk crystal.

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Periodical:

Edited by:

Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki

Pages:

179-182

DOI:

10.4028/www.scientific.net/KEM.388.179

Citation:

R. Morohashi et al., "Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties", Key Engineering Materials, Vol. 388, pp. 179-182, 2009

Online since:

September 2008

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$35.00

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