Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties
Lithium niobate (LiNbO3) thin films were deposited on Al2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at = 632.8 nm, which is close to that of bulk crystal.
Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
R. Morohashi et al., "Preparation of Epitaxial LiNbO3 Thin Film by MOCVD and its Properties", Key Engineering Materials, Vol. 388, pp. 179-182, 2009