Effects of UV Irradiation on Microstructure and Properties of HfO2 Films Prepared from Alkoxy-Derived Precursor Solution

Kazuyuki Suzuki; Kazumi Kato

doi:10.4028/www.scientific.net/KEM.421-422.91

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Effect of Incubation Time on Deposition Behavior of Ruthenium Films by MOCVD Using (2,4-Dimethylpentadienyl)(Ethylcyclopentadienyl)Ruthenium
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Effects of UV Irradiation on Microstructure and Properties of HfO₂ Films Prepared from Alkoxy-Derived Precursor Solution
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HomeKey Engineering MaterialsKey Engineering Materials Vols. 421-422Effects of UV Irradiation on Microstructure and...

Effects of UV Irradiation on Microstructure and Properties of HfO₂ Films Prepared from Alkoxy-Derived Precursor Solution

Abstract:

The HfO2 films prepared from alkoxy-derived precursor solution chemically modified with diethanolamine. The effects of UV irradiation on the HfO2 films were investigated. The UV irradiation using low pressure mercury lamp (LPML) was effective for the organics decomposition in the film and densification. The uniform and smooth HfO2 films were obtained. The refractive index of HfO2 films was enhanced.