Morphological and Magnetic Properties of Co100-xCux Film Prepared by RF-Sputtering

Gun Chaloeipote; Watcharee Rattanasakulthong

doi:10.4028/www.scientific.net/KEM.659.599

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HomeKey Engineering MaterialsKey Engineering Materials Vol. 659Morphological and Magnetic Properties of...

Morphological and Magnetic Properties of Co_100-xCu_x Film Prepared by RF-Sputtering

Abstract:

Granular Co_100-xCu_x films with different compositions of x = 19, 40, 54, 65 and 76 were deposited on glass substrates using sputter deposition. Co (HCP) and Cu (FCC) phases were observed in all deposited Co-Cu films. Film thickness was increased with increasing Cu-composition. The minimum and maximum values of electrical resistance measured using a four-point probe were observed on the Co₂₄Cu₇₆ and Co₄₆Cu₅₄ films, respectively, which confirmed that the electrical property of the films is a function of the film thickness and composition. The morphological and magnetic properties of all deposited films were clearly dependent on film composition. The AFM result confirmed the dependence of surface morphology and magnetic properties on the film composition because of the difference in the deposition rate between Co and Cu atoms during the sputtering process. The VSM results showed that all films had a ferromagnetic phase when the magnetic field was applied perpendicular to the film plane. All results confirmed that the desired morphological, electrical and magnetic properties of Co-Cu granular film can be achieved by manipulating its chemical composition.

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Periodical:

Key Engineering Materials (Volume 659)

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599-603

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https://doi.org/10.4028/www.scientific.net/KEM.659.599

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Online since:

August 2015

Authors:

Gun Chaloeipote, Watcharee Rattanasakulthong*

Keywords:

Chemical Composition, Co-Cu Film, Magnetic Property, Sputter Deposition

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References

[1] V.M. Fedosyuk, O.I. Kasyutich, D. Ravinder and H.J. Blythe, Giant magnetoresistance in granular electrodeposited CuCo Films, J. Magn. Magn. Mater. 156 (1996) 345-346.

DOI: 10.1016/0304-8853(95)00893-4

Google Scholar

[2] H. Errahmani, A. Berrada, G. Schmerber and A. Dinia, Comparative study between the effect of annealing and substrate temperature on the magnetic and transport properties of Co20Cu80 granular alloys, Material Letters. 51 (2001) 48-55.

DOI: 10.1016/s0167-577x(01)00263-4

Google Scholar

[3] S.I. Tanase, D. Pinzaru, P. Pascariu, M. Dobromir, A.V. Sandu and V. Georgescu, Effect of nitrogen addition on the morphology, magnetic and magnetoresistane properties of electrodeposited Co, Ni and Co-Ni granular thin films onto aluminium substrates, Material Chemistry and Physics. 130 (2011).

DOI: 10.1016/j.matchemphys.2011.06.055

Google Scholar

[4] K. Kakizaki, S. Yasoshima, K. -K. Choi, K. Kamishima and N. Hiratsuka, Fine structures and magnetic properties of FeCo granular thin films with plasma polymerized (C4F8)n matrix, Journal of Magnetic Materials. 310 (2007) 870-872.

DOI: 10.1016/j.jmmm.2006.11.133

Google Scholar

[5] A. Sharma, P. Bhatt, R. Brajpuriya, S. Tripathi and S.M. Chaudhari, Correlation study between structural, magnetic and transport properties of annealed Co thin films, Vacuum. 78 (2005) 47-51.

DOI: 10.1016/j.vacuum.2004.12.013

Google Scholar

[6] Changdar Tsai, James Liang, H.H. Liang and C.M. Wang, Sputtering parameters affecting the corrosion resistance of CoCrPt thin film media, Journal of Magnetism and Magnetic Materials. 209 (2000) 157-159.

DOI: 10.1016/s0304-8853(99)00674-5

Google Scholar

[7] J.P. Andres, J. Colino and J.M. Riveiro, Enhancement of GMR in as-deposited Co-Cu granular films with RF sputtering power, Journal of Magnetism and MagneticMaterials. 196-197 (1999) 493-494.

DOI: 10.1016/s0304-8853(98)00844-0

Google Scholar

[8] Dileep Kumar and Ajay Gupta, Evolution of structural and magnetic properties of sputtered nanocrystalline Co thin films with thermal annealing, Journal of Magnetism and Magnetic Materials. 308 (2007) 318-324.

DOI: 10.1016/j.jmmm.2006.06.008

Google Scholar

[9] V.V. Hiep, N. Chau, D.M. Hong and N.H. Luong, High coercivity and giant magnetoresistance of CoAg, CoCu granular films, J. Magn. Magn. Mater. 310 (2007) 2524-2526.

DOI: 10.1016/j.jmmm.2006.11.136

Google Scholar

[10] Gyana R. Pattanaik, Dinesh K. Pandya and Subhash C. Kashyap, Giant magnetoresistance and magnetic properties of electrodeposited Co-Cu granular films, Journal of Alloys and Compounds. 326 (2001) 260-264.

DOI: 10.1016/s0925-8388(01)01314-7

Google Scholar

[11] A.N. Pohoril, A.F. Kravetz, E.V. Shipil, A. Ya. Vovk, Chang Sik Kim and H.R. Khan, Effect of annealing and chemical composition on the giant magnetoresistance of electron beam deposited CoxCu(100-x)(11≤ X ≤45) granular films, Journal of Magnetism and Magnetic Materials. 186 (1998).

DOI: 10.1016/s0304-8853(98)00050-x

Google Scholar