Accelerated Testing of SiC Power Devices under High-Field Operating Conditions

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Abstract:

Power metal-oxide-semiconductor field-effect transistors (MOSFETs) experience conditions of high field during normal operation. During switching conditions, unexpected transient events may occur which force devices into avalanche or short circuit conditions. Moreover, silicon carbide devices typically experience higher fields in the gate oxide and drift regions than comparable Si devices due to channel and drift property differences. A summary of SiC MOSFET reliability and ruggedness test results are reported here. Reliability tests under high field conditions: positive-bias and negative-bias temperature instability (PBTI, NBTI) to examine threshold stability; time-dependent dielectric breakdown (TDDB) for gate oxide lifetime extrapolation; high-temperature reverse bias (HTRB); and HTRB testing under high neutron flux to determine terrestrial neutron single-event burnout (SEB) rates. High-power ruggedness evaluation is presented for SiC MOSFETs under forced avalanche conditions (unclamped inductive switching (UIS)) and under short-circuit operation to bound device safe operating areas. Overall results demonstrate the intrinsic reliability of SiC MOSFETs.

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[1] J. W. Palmour, L. Cheng, V. Pala, E. V. Brunt, D. J. Lichtenwalner, G.-Y. Wang, J. Richmond, M. O'Loughlin, S. Ryu, S. T. Allen, A. A. Burk, and C. Scozzie, Proc. of the 26th Inter. Symp. on Power Semiconductor Devices & IC's (ISPSD), pp.79-82, (2014).

DOI: 10.1109/ispsd.2014.6855980

Google Scholar

[2] D.B. Habersat, R. Green, A.J. Lelis, 2016 IEEE International Reliability Physics Symposium IRPS (2016) pp. CD.4.1–CD.4.5.

Google Scholar

[3] D.J. Lichtenwalner, B. Hull, E. Van Brunt, S. Sabri, D.A. Gajewski, D. Grider, S. Allen, and J.W. Palmour, A. Akturk, and J. McGarrity, IEEE International Reliability Physics Symposium IRPS (2018) 2B.2-1 – 2B.2-6.

DOI: 10.1109/irps.2018.8353544

Google Scholar

[4] T. Aichinger, G. Rescher, and G. Pobegan, Microelectronics Reliability 80 (2018) pp.68-78.

Google Scholar

[5] J.H. Stathis and S. Zafar, Microelectronics Reliability 46 (2006) pp.270-286.

Google Scholar

[6] D.K. Schroder, Microelectronics Reliability 44 (2007) pp.841-852.

Google Scholar

[7] J.W. McPherson, Reliability Physics and Engineering, Springer New York (2010).

Google Scholar

[8] A. Berman, IEEE International Reliability Physics Symposium IRPS (1981) pp.204-209.

Google Scholar

[9] H.C. Cramer, J.D. Oliver, and R.J. Porter, Proc. 2006 CS MANTECH Conf. pp.91-94.

Google Scholar

[10] Z. Chbili, K.P. Cheung, J.P. Campbell, J. Chbili, M. Lahbabi, D.E. Ioannou, and K. Matocha, Mat. Sci. Forum 858 (2016) pp.615-618.

DOI: 10.4028/www.scientific.net/msf.858.615

Google Scholar

[11] D.A. Gajewski, B. Hull, D.J. Lichtenwalner, S.-H. Ryu, E. Bonelli, H. Mustain, G. Wang, S.T. Allen, and J.W. Palmour, IEEE International Int. Reliab. Workshop IIRW (2016) 29-34.

DOI: 10.1109/iirw.2016.7904895

Google Scholar

[12] E. Normand, D. L. Oberg, J. L. Wert, J. D. Ness, P. P. Majewski, S. Wender, and A. Gavron, IEEE Trans. Nucl. Sci. 41 (1994) pp.2203-2209.

DOI: 10.1109/23.340563

Google Scholar

[13] H. R. Zeller, Solid State Electronics 38 (1995) pp.2041-2046.

Google Scholar

[14] J. F. Ziegler, IBM J. Res. Develop. 40 (1996) pp.19-39.

Google Scholar

[15] A. Akturk, R. Wilkins, J. McGarrity, and B. Gersey, IEEE Trans. Nucl. Sci. 64 (2017) pp.529-535.

DOI: 10.1109/tns.2016.2640945

Google Scholar

[16] D.J. Lichtenwalner, A. Akturk, J. McGarrity, J. Richmond, T. Barbieri, B. Hull, D. Grider, S. Allen, and J.W. Palmour, Mat. Sci. Forum Vol. 924 (2018) 559-562.

DOI: 10.4028/www.scientific.net/msf.924.559

Google Scholar

[17] N. Kaminski, A. Kopta, Application Note 5SYA 2042-04 (2013).

Google Scholar

[18] H. Asai, I. Nashiyama, K. Sugimoto, K. Shiba, Y. Sakaide, Y. Ishimaru, Y. Okazaki, K. Noguchi, and T. Morimura, IEEE Trans. Nucl. Sci., 61 (2014) pp.3109-3114.

DOI: 10.1109/tns.2014.2371892

Google Scholar

[19] A. Bolotnikov et al., Proc, IEEE Appl. Power Electron. Conf. Expos. (2015) 2445-2452.

Google Scholar

[20] C. DiMarino & B. Hull, IEEE ISPSD (2015) pp.263-267.

Google Scholar

[21] A. Bolotnikov, P. Losee, R. Ghandi, A. Halverson, and L. Stevanovic, Mat. Sci. Forum Vol. 963 (2019) 801-804.

DOI: 10.4028/www.scientific.net/msf.963.801

Google Scholar