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Passivation of InP for Optoelectronics
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HomeMaterials Science ForumMaterials Science Forum Vols. 185-188Formation of Oxide Films on HgCdTe after...

Formation of Oxide Films on HgCdTe after Fluorine-Consist Rinsing

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Passivation of Metals and Semiconductors

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Periodical:

Materials Science Forum (Volumes 185-188)

Pages:

209-220

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.185-188.209

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Online since:

March 1995

Authors:

L. Romashko, A. Myasnikov, V.N. Ovsyuk, V. Vasilyev, T. Zemtsova

Keywords:

Fluorine Rinsing, Impurity, Interface, Native Oxide, Photodiode, Surface

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© 1995 Trans Tech Publications Ltd. All Rights Reserved

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