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HomeMaterials Science ForumMaterials Science Forum Vols. 248-249Plasma Immersion Ion Implantation of Nitrogen into...

Plasma Immersion Ion Implantation of Nitrogen into Porous Silicon Layers

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Materials Science Applications of Ion Beam Techniques

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Periodical:

Materials Science Forum (Volumes 248-249)

Pages:

233-236

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.248-249.233

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Online since:

May 1997

Authors:

A. Manuaba, I. Pintér, E. Szilágyi, Gábor Battistig, C. Ortega, A. Grosman, G. Amsel

Keywords:

Ion Beam Analysis, Ion Implantation, Plasma Immersion, Porous Silicon (PS)

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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