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HomeMaterials Science ForumMaterials Science Forum Vols. 248-249Defect Formation by Low Energy Ions during Sputter...

Defect Formation by Low Energy Ions during Sputter Deposition of TiW and Au on Epitaxially Grown n-Si at Different Plasma Pressures

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Materials Science Applications of Ion Beam Techniques

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Periodical:

Materials Science Forum (Volumes 248-249)

Pages:

249-252

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.248-249.249

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Online since:

May 1997

Authors:

Prakash N.K. Deenapanray, F. Danie Auret, G. Myburg, M. Hayes, W.E. Meyer, C. Schutte

Keywords:

Defect, DLTS, Magnetron System, Sputter Deposition

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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