Influence of Annealing Conditions on Dopant Activation of Si+ and Mg+ Implanted GaN

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Periodical:

Materials Science Forum (Volumes 338-342)

Edited by:

Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer

Pages:

1615-1618

DOI:

10.4028/www.scientific.net/MSF.338-342.1615

Citation:

A. Suvkhanov et al., "Influence of Annealing Conditions on Dopant Activation of Si+ and Mg+ Implanted GaN", Materials Science Forum, Vols. 338-342, pp. 1615-1618, 2000

Online since:

May 2000

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$35.00

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