Low Temperature Annealing of Optical Centres in 4H SiC

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

637-640

Citation:

J. W. Steeds et al., "Low Temperature Annealing of Optical Centres in 4H SiC", Materials Science Forum, Vols. 457-460, pp. 637-640, 2004

Online since:

June 2004

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[1] A. Mattausch, M. Bockstedte and O. Pankratov, Mater. Sci. Forum Vols. 353-356 (2001), p.323.

[2] M-L. David, G. Alfieri, E. V. Monakhov, A. Hallén, J. F. Barbot and B. G. Svensson, Mater. Sci. Forum Vols. 433-436 (2003), P. 371.

[3] J. W. Steeds, G. A. Evans, S. Furkert, L. Ley, M. Hundhausen, N. Schulz and G. Pensl, Mater. Sci. Forum Vols. 433-436 (2003), p.305.

DOI: https://doi.org/10.4028/www.scientific.net/msf.433-436.305

[4] J. W. Steeds, G. A. Evans, L. R. Danks, S. Furkert, W. Voegli, M. M. Ismael and F. Carosella, Diamond & Rel. Mater. 11 (2002) (1923).

[5] F. H. C. Carlsson, S. G. Sridhara, A. Hallén, J. P. Bergman and E. Janzén, Mater. Sci. Forum, Vols. 433-436 (2003), p.345.

[6] A. Mattausch, M. Bockstedte and O. Pankratov, Physica B 308-310 (2001) 656.