Residual Stress Measurement in Sputtered Copper Thin Films by Synchrotron Radiation and Ordinary X-Rays

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Periodical:

Materials Science Forum (Volumes 490-491)

Edited by:

Sabine Denis, Takao Hanabusa, Bob Baoping He, Eric Mittemeijer, JunMa Nan, Ismail Cevdet Noyan, Berthold Scholtes, Keisuke Tanaka, KeWei Xu

Pages:

661-666

DOI:

10.4028/www.scientific.net/MSF.490-491.661

Citation:

M. Hataya et al., "Residual Stress Measurement in Sputtered Copper Thin Films by Synchrotron Radiation and Ordinary X-Rays", Materials Science Forum, Vols. 490-491, pp. 661-666, 2005

Online since:

July 2005

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$35.00

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