Tailored Electrochemical Surface Modification of Semiconductors
The paper gives an overview of recent research activities that explore new pathways to achieve selective structurization of semiconductor surfaces by electrochemical deposition or dissolution techniques. Of a particular emphasis are pathways that are based on a two step procedure: First, locally a semiconductor surface is selectively activated (or de-activated) using techniques with a high lateral resolution (focussed ion electron beam, or AFM). In a second step, an electrochemical reaction (dissolution or material deposition) is selectively carried out at sensitized surface locations. Different examples of this strategy are given including selective suppression of a surface by damage induced amorphization. Additionally, smart structuring approaches involving self-organization of deposition or dissolution processes are shortly discussed.
Yukichi Umakoshi and Shinji Fujimoto
P. Schmuki "Tailored Electrochemical Surface Modification of Semiconductors", Materials Science Forum, Vol. 512, pp. 129-136, 2006