Tailored Electrochemical Surface Modification of Semiconductors

Patrik Schmuki

doi:10.4028/www.scientific.net/MSF.512.129

Paper Titles

Effect of Electron Irradiation on Nanocrystallization of Fe-Nd-B Amorphous Alloys
p.107

Isothermal Oxidation Behavior of Ru Modified Aluminide Coating on a Fourth Generation Single Crystal Superalloy
p.111

Variant Selection of Plate Martensite in Fe-28.5at.%Ni Alloy
p.117

Internal Stress Field in Ultrafine Grained Aluminium Fabricated by Accumulative Roll-Bonding
p.123

Tailored Electrochemical Surface Modification of Semiconductors
p.129

Application of Large Magnetocaloric Effects in Itinerant-Electron Metamagnets to Cooling Systems
p.137

Ferromagnetic Shape-Memory Alloys
p.145

Development of Photonic Fractals as New Functionally Structured Materials for Electromagnetic Wave Control
p.153

Behaviors of Nonequilibrium Carriers in Er, O-Codoped GaAs for 1.5μm Light-Emitting Devices with Extremely Stable Wavelength
p.159

HomeMaterials Science ForumMaterials Science Forum Vol. 512Tailored Electrochemical Surface Modification of...

Tailored Electrochemical Surface Modification of Semiconductors

Abstract:

The paper gives an overview of recent research activities that explore new pathways to achieve selective structurization of semiconductor surfaces by electrochemical deposition or dissolution techniques. Of a particular emphasis are pathways that are based on a two step procedure: First, locally a semiconductor surface is selectively activated (or de-activated) using techniques with a high lateral resolution (focussed ion electron beam, or AFM). In a second step, an electrochemical reaction (dissolution or material deposition) is selectively carried out at sensitized surface locations. Different examples of this strategy are given including selective suppression of a surface by damage induced amorphization. Additionally, smart structuring approaches involving self-organization of deposition or dissolution processes are shortly discussed.