Tailored Electrochemical Surface Modification of Semiconductors

Abstract:

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The paper gives an overview of recent research activities that explore new pathways to achieve selective structurization of semiconductor surfaces by electrochemical deposition or dissolution techniques. Of a particular emphasis are pathways that are based on a two step procedure: First, locally a semiconductor surface is selectively activated (or de-activated) using techniques with a high lateral resolution (focussed ion electron beam, or AFM). In a second step, an electrochemical reaction (dissolution or material deposition) is selectively carried out at sensitized surface locations. Different examples of this strategy are given including selective suppression of a surface by damage induced amorphization. Additionally, smart structuring approaches involving self-organization of deposition or dissolution processes are shortly discussed.

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Periodical:

Edited by:

Yukichi Umakoshi and Shinji Fujimoto

Pages:

129-136

DOI:

10.4028/www.scientific.net/MSF.512.129

Citation:

P. Schmuki "Tailored Electrochemical Surface Modification of Semiconductors", Materials Science Forum, Vol. 512, pp. 129-136, 2006

Online since:

April 2006

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$35.00

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