Silicon Carbide Crystalline Films Synthesis out of Organosilicon Monomers Vapors in Reactor with Cold Walls

Abstract:

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The possibility of silicon carbide films production out of organosilicon chlorine-containing monomers is under analysis in this research. Silicon carbide films samples were produced by chemical deposition method out of gas phase in reactor with “cold walls”, in the conditions of low pressure. The influence of monomer type, substrate temperature on crystalline SiC films composition is also under consideration. The results of infrared spectroscopy, Raman scattering spectrometry and x-ray phase analysis are presented.

Info:

Periodical:

Materials Science Forum (Volumes 615-617)

Edited by:

Amador Pérez-Tomás, Philippe Godignon, Miquel Vellvehí and Pierre Brosselard

Pages:

173-176

DOI:

10.4028/www.scientific.net/MSF.615-617.173

Citation:

B. M. Sinelnikov et al., "Silicon Carbide Crystalline Films Synthesis out of Organosilicon Monomers Vapors in Reactor with Cold Walls", Materials Science Forum, Vols. 615-617, pp. 173-176, 2009

Online since:

March 2009

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Price:

$35.00

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