Evaluation of Silicon Substrates Fabricated by Seeding Cast Technique

Abstract:

We evaluated the properties of crystalline defects in silicon substrate, and clarified the origin of small-angle grain boundaries. In order to eliminate the effects of grain boundaries, the ingot was fabricated by unidirectional solidification technique with seed crystal. In single-crystalline region, Σ3 twin boundaries and SiC precipitates were observed near the seed crystal. No obvious relationship between twin boundaries and precipitates was observed. These defect decreased once and the precipitations appeared again. The density of precipitates increased through the crystal growth procedure. These precipitates were consisted of Si, C, and N. After the precipitation density increased, the small-angle grain boundaries appeared and some precipitates were observed at the boundaries. We considered the precipitations consisted of light element impurities such as C and N were one of the major origins of the small-angle grain boundary generation.

• Periodical: Materials Science Forum (Volume 725)
• Pages: 133-136
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.725.133
• Online since: July 2012
• Authors: Tomihisa Tachibana, Takashi Sameshima, Takuto Kojima, Koji Arafune, Koichi Kakimoto, Yoshiji Miyamura, Hirofumi Harada, Takashi Sekiguchi, Yoshio Ohshita, Atsushi Ogura
• Keywords: Crystalline Defect, Small Angle Grain Boundary

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