Improve the P-Type Conductivity of SnO Films by Na Ion Implantation

Abstract:

P-type transparent conducting SnO thin films were directly fabricated using RF magnetron sputtering. The electronic properties of the SnO thin films were enhanced by Na ion implantation and annealing at 200°C. The growth and implantation conditions were systemically investigated. The electronic properties, optical properties, microstructure and surface morphologies of the films were characterized. It was observed that the structure of the Na-doped SnO films was crucial to improving their p-type conductivity.

• Periodical: Materials Science Forum (Volume 848)
• Pages: 477-481
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.848.477
• Online since: March 2016
• Authors: Tie Ying Yang, Jun Zhao, Xiao Long Li, Xing Yu Gao, Chao Fan Xue, Yan Qing Wu, Ren Zhong Tai
• Keywords: Ion Implantation, P-Type Transparent Conducting Oxide, RF Magnetron Sputtering, SnO Thin Film

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