Experimental and Theoretical Study of 4H-SiC JFET Threshold Voltage Body Bias Effect from 25 °C to 500 °C

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Abstract:

This work reports a theoretical and experimental study of 4H-SiC JFET threshold voltage as a function of substrate body bias, device position on the wafer, and temperature from 25 °C (298K) to 500 °C (773K). Based on these results, an alternative approach to SPICE circuit simulation of body effect for SiC JFETs is proposed.

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903-907

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May 2016

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© 2016 Trans Tech Publications Ltd. All Rights Reserved

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[1] D.J. Spry, P.G. Neudeck, L. Chen, D. Lukco, C.W. Chang and G.M. Beheim, accepted for publication in Mater. Sci. Forum as ICSCRM-2015 proceedings.

Google Scholar

[2] P.G. Neudeck, L. Chen, D.J. Spry, G.M. Beheim and C.W. Chang, Mater. Sci. Forum 821-823 (2015) 781-784.

Google Scholar

[3] G.W. Neudeck, The PN Junction Diode, second ed., Addison-Wesley, Reading, Massachusetts, 1989, Chapter 2, pp.19-37.

Google Scholar

[4] The SPICE Page, http: /bwrcs. eecs. berkeley. edu/Classes/IcBook/SPICE.

Google Scholar

[5] P. Antognetti and G. Massobrio, Semiconductor Device Modeling with SPICE, McGraw-Hill, New York, (1987).

Google Scholar

[6] P.G. Neudeck, D.J. Spry, L. Chen, C.W. Chang, G.M. Beheim, R.S. Okojie, L.J. Evans, R. Meredith, T. Ferrier, M.J. Krasowski and N. F Prokop, in Proceedings 2008 IMAPS International Conference on High Temperature Electronics, published by International Microelectronics and Packaging Society, Washington DC, 2008, pp.95-102.

DOI: 10.1557/proc-1069-d11-02

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