Influence of n-Type Doping Levels on Carrier Lifetime in 4H-SiC Epitaxial Layers

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In this study we have grown thick 4H-SiC epitaxial layers with different n-type doping levels in the range 1E15 cm-3 to mid 1E18 cm-3, in order to investigate the influence on carrier lifetime. The epilayers were grown with identical growth conditions except the doping level on comparable substrates, in order to minimize the influence of other parameters than the n-type doping level. We have found a drastic decrease in carrier lifetime with increasing n-type doping level. Epilayers were further characterized with low temperature photoluminescence and deep level transient spectroscopy.

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238-241

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May 2017

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© 2017 Trans Tech Publications Ltd. All Rights Reserved

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[1] I. Ivanov, C. Hallin, A. Henry, O. Kordina, E. Janzén, Nitrogen doping concentration as determined by photoluminescence in 4H- and 6H-SiC, J. Appl. Phys. 80 (1996) 3504-3508.

DOI: 10.1063/1.363221

Google Scholar

[2] T. Kimoto, K. Danno, J. Suda, Lifetime-killing defects in 4H-SiC epilayers and lifetime control by low-energy electron irradiation, Phys. Stat. Sol. (b) 245 (2008) 1327-1336.

DOI: 10.1002/pssb.200844076

Google Scholar

[3] N. T. Son, X. T. Trinh, L. S. Løvlie, B. G. Svensson, K. Kawahara, J. Suda, T. Kimoto, T. Umeda, J. Isoya, T. Makino, T. Ohshima, E. Janzén, Negative-U system of carbon vacancy in 4H-SiC, Phys. Rev. Lett. 109 (2012) 187603.

DOI: 10.1103/physrevlett.109.187603

Google Scholar

[4] L. Lilja, I. D. Booker, J. Hassan, E. Janzén, J. P. Bergman, Influence of growth conditions on carrier lifetime in 4H-SiC epilayers, J. Cryst. Growth 381 (2013) 43-50.

DOI: 10.1016/j.jcrysgro.2013.06.037

Google Scholar

[5] D. Larkin, P. G. Neudeck, J. A. Powell, L. G. Matus, Site-competition epitaxy for superior silicon carbide electronics, Appl. Phys. Lett. 65 (1994) 1659-1661.

DOI: 10.1063/1.112947

Google Scholar

[6] A. Galeckas, J. Linnros, V. Grivickas, U. Lindefelt, C. Hallin, Evaluation of Auger Recombination Rate in 4H-SiC, Mater. Sci. Forum 264-268 (1998) 533-536.

DOI: 10.4028/www.scientific.net/msf.264-268.533

Google Scholar

[7] J. Cottom, G. Gruber, P. Hadley, M. Koch, G. Pobegen, T. Aichinger, A. Shluger, Recombination centers in 4H-SiC investigated by electrically detected magnetic resonance and ab initio modeling, J. Appl. Phys. 119 (2016) 181507.

DOI: 10.1063/1.4948242

Google Scholar