[1]
S. Ryu, C. Capell, E. Van Brunt, C. Jonas, J. Clayton, J. Palmour, M. Hinojosa, C. W. Tipton and C. Scozzie, Ultra High Voltage MOS Controlled 4H-SiC Power Switching Devices, Semiconductor Science Technology, 30, 084001 (2015).
DOI: 10.1088/0268-1242/30/8/084001
Google Scholar
[2]
Doohyung Cho, Seulgi Sim, Kunsik Park, Jongil Won, Sanggi Kim and Kwangsoo Kim, High-voltage 4H-SiC Trench MOS Barrier Schottky Rectifier with Low Forward Voltage Drop Using Enhanced Sidewall Layer, Japanese Journal of Applied Physics, 54, 121301 (2015).
DOI: 10.7567/jjap.54.121301
Google Scholar
[3]
S. Noll, M. Rambach, M. Grieb, D. Scholten, A. J. Bauer and L. Frey, Effect of Shallow n-Doping on Field Effect Mobility in p-Doped Channels of 4H-SiC MOS Field Effect Transistors, Materials Science Forum, 778-780, 702-705 (2014).
DOI: 10.4028/www.scientific.net/msf.778-780.702
Google Scholar
[4]
C. Y. Lee, C. T. Yen, K. W. Chu, Y. S. Chen, C. C. Hung, L.S. Lee, C. C. Huang and M. J. Tsai, A Novel 4H-SiC Trench MOS Barrier Schottky Rectifier Fabricated by a Two-mask Process, ISPSD, 171-174 (2013).
DOI: 10.1109/ispsd.2013.6694473
Google Scholar
[5]
Z. Chen, Y. Y. Yao, M. Danilovic, D. Boroyevich, Performance Evaluation of SiC Power MOSFETs for High-temperature Applications, EPE-PEMC, (2012).
DOI: 10.1109/epepemc.2012.6397198
Google Scholar
[6]
Y. Nanen, M. Aketa, Y. Nakano, H. Asahara, T. Nakamura. Electrical Characterization of 1. 2 kV-Class SiC MOSFET at High Temperature up to 380°C, Materials Science Forum. 858, 885-888 (2016).
DOI: 10.4028/www.scientific.net/msf.858.885
Google Scholar
[7]
B. Maxime, O. Remy, C. Thibault, B. Pierre, O. Sebastion, T. Dominique, Electrical Performances and Reliability of Commercial SiC MOSFETs at high temperature and in SC Conditions, EPE-ECCE, (2015).
DOI: 10.1109/epe.2015.7309455
Google Scholar
[8]
B. J. Baliga, Fundamentals of Power Semiconductor Devices, Springer Science, (2008).
Google Scholar