Preparation and Microstructure, Mechanical, Tribological Properties of Niobium Carbide Films

Article Preview

Abstract:

Niobium carbide films was deposited by direct current reactive magnetron sputtering on Si (001) substrates in discharging a mixture of CH4/Ar gas. The effects of growth temperature (Ts) and methane flow rate (FCH4) on the phase structure, composition, mechanical and tribological properties for NbCx films were explored. For the film grown at FCH4=6 sccm, a phase transition from cubic-NbC phase to hexagonal-Nb2C phases occurred with increasing the Ts; In contrast, when the film deposited at FCH4=16 sccm, only the cubic-NbC phase was observed at different Ts. The surface of all the films became rough with increasing the Ts. In addition, when the Ts increased from RT to 600 °C, the films exhibited the compressive stress and kept rising. While as the Ts > 600 °C, the stress partially relaxed both at FCH4=6 sccm and FCH4=16 sccm. The hardness (H) for sample grown at FCH4=6 sccm first increased up to a maximum value, and then decreased with increasing the Ts. And the films grown at FCH4=16 sccm kept decreasing with the maximum super-hard value of the filmsof 40.5 GPa at FCH4=6 sccm and 600 °C. The friction coefficient for the film obtained at FCH4=16 sccm was lower than that at FCH4=6 sccm, which might be due to the presence more carbon in the film grown at FCH4=16 sccm.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

1498-1504

Citation:

Online since:

June 2017

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2017 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] M.Y. Liao, Y. Gotoh, H. Tsuji, J. Ishikawa, J. Vac. Sci. Technol. B. 22 (2004) L24.

Google Scholar

[2] N.J.M. Carvalho, J.T.M. d. Hosson, Thin Solid Films. 388 (2001) 150.

Google Scholar

[3] Thummler F, Gustfeld C., Powder Metall. 23 (1991) 285.

Google Scholar

[4] Nedfors N, Tengstrand O, Lewin E, Furlan A, Eklund P, Hultman L, et al. Surf Coat Technol. 206 (2011) 354.

Google Scholar

[5] Ma J, Wu M, Du Y, Chen S, Jin W, Fu L, et al. J Alloys Compd. 475 (2009) 415.

Google Scholar

[6] Braic M, Braic V, Balaceanu M, Vladescu A, Zoita CN, Titorencu I, et al. Thin Solid Films. 519 (2011) 4064.

DOI: 10.1016/j.tsf.2011.01.193

Google Scholar

[7] Kan Zhang, M. Wen, Q.N. Meng, C.Q. Hu, X. Li, C. Liu, W.T. Zheng, Surface & Coatings Technology. 212 (2012) 185.

Google Scholar

[8] Kan Zhang, M. Wen, G. Cheng, X. Li, Q.N. Meng, J.S. Lian, W.T. Zheng, Vacuum. 99 (2014) 233.

Google Scholar

[9] Wen M, Hu CQ, Meng QN, Zhao ZD, An T, Su YD, et al. J Phys D Appl Phys. 42 (2009) 035304.

Google Scholar

[10] Matta C, Eryilmaz OL, Bouchet MIDB, Erdemir A, Martin JM, Nakayama K. J Phys D Appl Phys. 42 (2009) 075307.

Google Scholar

[11] Kan Zhang, M. Wen, Q.N. Meng, Y. Zeng, C.Q. Hu, C. Liu, W.T. Zheng, Surf. Coat. Technol. 206 (2012) 4040.

Google Scholar

[12] Kan Zhang, M. Wen, S. Wang, R.P. Deng, D. Gall, W.T. Zheng, Surf. Coat. Technol. 258 (2014) 746.

Google Scholar

[13] Voevodin AA, Phelps AW, Zabinski JS, Donley MS. Diam Relat Mater. 5 (1996) 1264.

Google Scholar