Development of Ferromagnetic Sputtering Targets with High Performance

Jun Feng Luo; Yun Yi Fang; Guo Jin Xu; Yong Jun Li; Xiao Dong Xiong

doi:10.4028/www.scientific.net/MSF.993.820

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HomeMaterials Science ForumMaterials Science Forum Vol. 993Development of Ferromagnetic Sputtering Targets...

Development of Ferromagnetic Sputtering Targets with High Performance

Abstract:

The preparation methods of high performance ferromagnetic sputtering targets (including cobalt, nickel-platinum and nickel-iron alloy) for advanced semiconductor manufacturing were introduced. The properties of sputtering target, such as pass-through-flux (PTF), and grain size which affect the sputtering performance were well controlled by proper fabrication technique. The key factors that affect sputtering performance were also discussed.

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Periodical:

Materials Science Forum (Volume 993)

Pages:

820-825

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.993.820

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Online since:

May 2020

Authors:

Jun Feng Luo*, Yun Yi Fang, Guo Jin Xu, Yong Jun Li, Xiao Dong Xiong

Keywords:

Ferromagnetism, High Purity, Microstructure, PTF, Sputtering Target

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