Pressure-Assisted Lateral Nanostructuring of the Epitaxial Silicon Layers with SiGe Quantum Wells

Abstract:

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Transformations of the SiGe/Si superlattice structures, either annealed at high pressure, or irradiated by high energy ions and subjected to post-implantation annealing, were studied and compared. Both types of treatments were found to lead to the formation of recharged defects clusters, resulting in the appearance of peaks on C-V characteristics, shrinkage of Ge profiles registered by SIMS technique after annealing, and disappearance of peaks in the free carrier profiles. The effects were more pronounced in the case of high energy ion implantation. The results are explained by the vacancy - assisted precipitation of Ge in SiGe layers.

Info:

Periodical:

Solid State Phenomena (Volume 114)

Edited by:

Witold Lojkowski and John R. Blizzard

Pages:

291-296

DOI:

10.4028/www.scientific.net/SSP.114.291

Citation:

I.V. Antonova et al., "Pressure-Assisted Lateral Nanostructuring of the Epitaxial Silicon Layers with SiGe Quantum Wells", Solid State Phenomena, Vol. 114, pp. 291-296, 2006

Online since:

July 2006

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Price:

$35.00

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