Current-Voltage Characteristic of C-RAM Nano-Cell-Element
Nano-cell-elements of chalcogenide random access memory (C-RAM) based on Ge2Sb2Te5 films have been successively fabricated by using the focused ion beam method. The minimum contact size between the Ge2Sb2Te5 phase change film and bottom electrode film in the nano-cell-element is in diameter of 90nm. The current-voltage characteristics of the C-RAM cell element are studied using the home-made current-voltage tester in our laboratory. The minimum SET current of about 0.3mA is obtained.
Chunli BAI, Sishen XIE, Xing ZHU
B. Liu et al., "Current-Voltage Characteristic of C-RAM Nano-Cell-Element", Solid State Phenomena, Vols. 121-123, pp. 591-594, 2007