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Current-Voltage Characteristic of C-RAM Nano-Cell-Element

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Abstract:

Nano-cell-elements of chalcogenide random access memory (C-RAM) based on Ge2Sb2Te5 films have been successively fabricated by using the focused ion beam method. The minimum contact size between the Ge2Sb2Te5 phase change film and bottom electrode film in the nano-cell-element is in diameter of 90nm. The current-voltage characteristics of the C-RAM cell element are studied using the home-made current-voltage tester in our laboratory. The minimum SET current of about 0.3mA is obtained.

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Periodical:

Solid State Phenomena (Volumes 121-123)

Pages:

591-594

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.121-123.591

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Online since:

March 2007

Authors:

Bo Liu, Zhi Tang Song, Song Lin Feng, Bomy Chen

Keywords:

Chalcogenide Random Access Memory, Current-Voltage Characteristic, Nano-Cell-Element

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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