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Thermal Properties of Cr- and Ni- Silicide Thin Films

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Periodical:

Solid State Phenomena (Volumes 124-126)

Pages:

189-194

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.124-126.189

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Online since:

June 2007

Authors:

Nam Ihn Cho, Se Jong Lee, Yo Seung Song, Deuk Yong Lee

Keywords:

Heater, Semiconductor Processing, Silicide, Temperature Coefficient of Resistance, Thin Film

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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References

[1] S. A. Campbell, The Science and Engineering of Microelectronic Fabrication, 2nd Edition, Oxford University Press, New York and Oxford, 2001.

Google Scholar

[2] J. S. Lim, Introduction to Semiconductor Manufacturing Equipment, Sungandang, Seoul, 2000.

Google Scholar

[3] S.O. Kasap, Principles of Electronic Materials and Devices, 2nd ed., McGraw-Hill, New York 118, 2002.

Google Scholar

[4] M. Mieno, T. Yoshida, Japanese Journal of Applied Physics, 29, 7 (1990) L1175.

Google Scholar

[5] S. Kamisuki, M. FuJii, T. Takekoshi, C. Tezuka and M. Atobe, Proc. of IEEE, The 13th Annual International Workshop on Micro Electro Mechanical Systems, (2000) 793.

DOI: 10.1109/memsys.2000.838619

Google Scholar

[6] CoorTek, Thick Film Substrates Technical Specifications, www.coorstek.com, 37-30897 2003.

Google Scholar

[7] N. I. Cho and M. C. Kim, Thin Solid Films, 475 (2005) 235.

Google Scholar

[8] S. P. Murarka, Silicides for VLSI Applications, Academic Press, Orlando, 1983.

Google Scholar

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