[1]
T. Hattori: Ultraclean Surface Processing of Silicon Wafers (Springer, Heidelberg, 1998), p.437.
Google Scholar
[2]
H.F. Okorn-Schmidt: IBM J. Res. Develop. 43 3 (1999), pp.351-365.
Google Scholar
[3]
P. Allongue, C.H. Villeneuve, S. Morin, R. Boukherroub, D. D. M. Wayner: Electrochimica Acta (2000), p.4591.
DOI: 10.1016/s0013-4686(00)00610-1
Google Scholar
[4]
H. Angermann, W. Henrion, M. Rebien, A. Röseler: Appl. Surf. Sci. 235 (2004), pp.322-339.
Google Scholar
[5]
K. Heilig: Experimentelle Technik der Physik 14 (1968), p.135.
Google Scholar
[6]
J. Rappich, V. Yu. Timoshenko and Th. Dittrich: J. Electrochem. Soc. 144 (1997), pp.493-496.
Google Scholar
[7]
V. Yu. Timoshenko, A.B. Petrenko, M.N. Stolyarov, Th. Dittrich, W. Füssel, and J. Rappich: J. Appl. Phys. 85(2) (1999), pp.4171-4175.
Google Scholar
[8]
W. Kern: J. Electrochem. Soc. 137 (1990), p.1887.
Google Scholar
[9]
S. Adachi and K. Utani: Jpn. J. Appl. Phys. 32 (1993), L1189.
Google Scholar
[10]
Akiyama: Jpn. J. Appl. Phys. 34 (1995), L153.
Google Scholar
[11]
Y.A. Chabal, G.S. Higashi, K. Raghavachari, and V.A. Burrows: J. Vac. Sci. Technol. A7 (3) (1989), p.2104.
Google Scholar
[12]
H. -J. Lewerenz and H. Jungblut: Semiconductor Micromachining, Vol. 1: Fundamental Electrochemistry and Physics, edited by S. A. Campbell and H. -J. Lewerenz (John Wiley & Sons, New York, 1998) pp.217-275.
Google Scholar
[13]
Y. J. Chabal, K. Raghavachari, X. Zhang, E. Garfunkel: Phys. Rev. B. 66 (2002), p.161315.
Google Scholar
[14]
H. Noguchi, S. Adachi, Appl. Sur. Sci. 246 (2005), p.139.
Google Scholar
[15]
W. Henrion, M. Rebien, H. Angermann, A. Röseler: Appl. Surf. Sci. 202 (2002), p.199.
Google Scholar
[16]
E. Jablonovitch, D. L. Allara, C. C. Chang, T. Gmitter, and T. B. Bright: Phys. Rev. Lett. 57, (1986), p.249.
Google Scholar
[17]
H. Angermann: Anal. Bioanal. Chem. 374 (2002), p.676.
Google Scholar
[18]
U. Neuwald: H. E. Hessel, A. Feltz, U. Memmert, and R. J. Behm, Surf. Sci. Lett. 296, (1993), L8.
Google Scholar
[19]
H. Angermann, W. Henrion, A. Röseler: Wet-Chemical Conditioning of Silicon: Electronic Properties Correlated with the Surface Morphology, in Silicon-Based Materials and Devices, edited by H. S. Nalwa (Academic Press, San Diego 2001), pp.267-298.
DOI: 10.1016/b978-012513909-0/50009-x
Google Scholar