Passivation Studies of Germanium Surfaces

Jung Yup  Kim; Jim  McVittie; Krishna Saraswat; Yoshio Nishi

doi:10.4028/www.scientific.net/SSP.134.33

Paper Titles

Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool
p.15

Implementing an In Situ Surface Preparation Prior to Ni Deposition for Ni Salicide Processes
p.19

Electrical Impact of Various Arsenic-Residues Cleanings
p.23

Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning
p.27

Passivation Studies of Germanium Surfaces
p.33

Germanium Surface Passivation Using Ozone Gaseous Phase
p.37

Surface States and Recombination Loss on Wet-Chemically Passivated Si Studied by Surface Photovoltage (SPV) and Photoluminescence (PL)
p.41

Surface Microroughness of Silicon in Wet Process and its Minimization
p.45

Oxidation of Si Surface Utilizing SCCO₂
p.49

HomeSolid State PhenomenaSolid State Phenomena Vol. 134Passivation Studies of Germanium Surfaces

Passivation Studies of Germanium Surfaces

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Solid State Phenomena (Volume 134)

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33-36

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.33

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Online since:

November 2007

Authors:

Jung Yup Kim, Jim McVittie, Krishna Saraswat, Yoshio Nishi

Keywords:

Cleaning, Germanium, HBr, HCl, HF, HI, Passivation, X-Ray Photoelectron Spectroscopy (XPS)

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