Watermark-Free and Efficient Spray Clean on Hydrophobic Surface with Single-Wafer Technology

N. Belmiloud; N. Kenkare

doi:10.4028/www.scientific.net/SSP.255.152

Paper Titles

Deep Trench Isolation and through Silicon via Wetting Characterization by High-Frequency Acoustic Reflectometry
p.129

Pattern Collapse of High-Aspect-Ratio Silicon Nanostructures - A Parametric Study
p.136

Influence of CO₂ Gas Atmosphere on the Liquid Filling of Superhydrophobic Nanostructures
p.141

Some Critical Issues in Pattern Collapse Prevention and Repair
p.147

Watermark-Free and Efficient Spray Clean on Hydrophobic Surface with Single-Wafer Technology
p.152

Extended-Nanofluidic Devices and the Unique Liquid Properties - Invited Paper
p.157

Measurement of the Frictional Force between PVA Roller Brushes and Semiconductor Wafers with Various Films Immersed in Chemicals
p.163

Removal of Bull’s Eye Signature by Optimizing Wet Cleans Recipe
p.168

Toward CO₂ Beam Cleaning of 20-nm Particles in Atmospheric Pressure
p.172

HomeSolid State PhenomenaSolid State Phenomena Vol. 255Watermark-Free and Efficient Spray Clean on...

Watermark-Free and Efficient Spray Clean on Hydrophobic Surface with Single-Wafer Technology

Abstract:

The interaction of spray-based physical clean and hydrophobic surfaces is studied on a single-wafer technology. A model simulating a rolling water marble on a rotating disk describes accurately the footprint of watermarks, Contrary to its oxide, on a silicon surface the adhesion of particles does not depend on the pH value but on the rotation speed. This newly proposed method, based on the simultaneous combination of spray and liquid dispense is then compared to the standard IPA-based process. Despite the non-usage of solvents, the substrates show similar particles level, defectivity and epi-growth quality.

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Periodical:

Solid State Phenomena (Volume 255)

Pages:

152-156

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.255.152

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Online since:

September 2016

Authors:

N. Belmiloud*, N. Kenkare

Keywords:

Hydrophobic, Particles, Single-Wafer, Spray Clean, Zeta-Potential

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