Surface Damage Induced by Reactive Ion Etching in n- Type Silicon

Abstract:

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Periodical:

Solid State Phenomena (Volumes 47-48)

Edited by:

H. Richter, M. Kittler and C. Claeys

Pages:

383-390

DOI:

10.4028/www.scientific.net/SSP.47-48.383

Citation:

A. Poggi and E. Susi, "Surface Damage Induced by Reactive Ion Etching in n- Type Silicon", Solid State Phenomena, Vols. 47-48, pp. 383-390, 1996

Online since:

July 1995

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$35.00

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