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Low-Frequency Noise Sources Related to Processing-Induced Extended Defects in Si Devices

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Periodical:

Solid State Phenomena (Volumes 47-48)

Pages:

403-408

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.47-48.403

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Online since:

July 1995

Authors:

Eddy Simoen, Jan Vanhellemont, Cor Claeys

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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