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HomeSolid State PhenomenaSolid State Phenomena Vols. 67-68Influence of Deposit Thickness on the...

Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane

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Abstract:

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Polycrystalline Semiconductors V

Info:

Periodical:

Solid State Phenomena (Volumes 67-68)

Pages:

125-130

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.67-68.125

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Cite this paper

Online since:

April 1999

Authors:

B. Caussat, J.P. Couderc, L. Vasquez, A. Figueras, A. Vander Lee, D. Cot, Jean Durand, V. Paillard, E. Scheid, B. Legros-de Mauduit, A. Vilà, J.R. Morante

Keywords:

Deposition Mechanism, Low Pressure Chemical Vapour Deposition, Microstructure, Silicon

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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