Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane

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Periodical:

Solid State Phenomena (Volumes 67-68)

Edited by:

J.H. Werner, H.P. Strunk, H.W. Schock

Pages:

125-130

DOI:

10.4028/www.scientific.net/SSP.67-68.125

Citation:

B. Caussat et al., "Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane", Solid State Phenomena, Vols. 67-68, pp. 125-130, 1999

Online since:

April 1999

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$35.00

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