Low-Pressure Chemical Vapor Deposition of Semi-Insulating Polycrystalline Silicon (SIPOS) and its Analysis: Application to Power Diode Passivation

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

391-396

DOI:

10.4028/www.scientific.net/SSP.80-81.391

Citation:

E.S. Ferreira and N.I. Morimoto, "Low-Pressure Chemical Vapor Deposition of Semi-Insulating Polycrystalline Silicon (SIPOS) and its Analysis: Application to Power Diode Passivation", Solid State Phenomena, Vols. 80-81, pp. 391-396, 2001

Online since:

November 2001

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$35.00

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