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HomeSolid State PhenomenaSolid State Phenomena Vols. 80-81Low-Pressure Chemical Vapor Deposition of...

Low-Pressure Chemical Vapor Deposition of Semi-Insulating Polycrystalline Silicon (SIPOS) and its Analysis: Application to Power Diode Passivation

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Polycrystalline Semiconductors VI

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Periodical:

Solid State Phenomena (Volumes 80-81)

Pages:

391-396

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.80-81.391

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Online since:

November 2001

Authors:

E.S. Ferreira, N.I. Morimoto

Keywords:

Low-Pressure Chemical Vapor Deposition, Passivation Layer, Power Device, Power Diodes, Semi-Insulating Polycrystalline Silicon

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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