Intra-Grain Defects - Limiting Factor for Low-Temperature Polycrystalline Silicon Films?

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

95-100

DOI:

10.4028/www.scientific.net/SSP.80-81.95

Citation:

T. A. Wagner et al., "Intra-Grain Defects - Limiting Factor for Low-Temperature Polycrystalline Silicon Films?", Solid State Phenomena, Vols. 80-81, pp. 95-100, 2001

Online since:

November 2001

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$35.00

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