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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Metallic Contamination Removal Evaluation for...

Metallic Contamination Removal Evaluation for Single Wafer Processing

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Abstract:

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

49-52

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.49

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Online since:

May 2003

Authors:

Pieter Boelen, Steven Verhaverbeke, Philippe Garnier, Didier Levy, Hitoshi Morinaga

Keywords:

Chelating Agent, Metallic Contamination, Single Wafer Cleaning

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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