Solid State Phenomena Vol. 92

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92

Export:

MARCXML

ToC:

Table of Contents

Paper Title Page

Preface Committees

Future Challenges for Cleaning in Advanced Microelectronics

Authors: Allen Bowling, Brian K. Kirkpatrick, Trace Hurd, Laura Losey, Phil Matz

Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers

Authors: Martine Claes, T. Witters, G. Loriaux, S. Van Elshocht, A. Delabie, Stefan De Gendt, Marc Heyns, Harald Okorn-Schmidt

Wet Etch Enhancement of HfO₂ Films by Implant Processing

Authors: Joel Barnett, Deborah J. Riley, Troy C. Messina, Pat Lysaght, Ron Carpio

Behaviour of High-k Dielectric Materials with Classical Cleaning Chemistries

Authors: Enrico Bellandi, Barbara Crivelli, Mauro Alessandri

Introduction of High-k Materials into Wet Processing, Analysis and Behavior

Authors: Bart Onsia, David Hellin, Martine Claes, A. Maes, Stefan De Gendt, Marc Heyns

Metallic Impurity Contamination from Tungsten Gate Cleaning

Authors: Geun Min Choi, Tadahiro Ohmi

Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning

Authors: Rita Vos, Marcel Lux, Sophia Arnauts, Karine Kenis, M. Maes, Bart Onsia, James Snow, Frank Holsteyns, Guy Vereecke, Paul W. Mertens, Marc Heyns, O. Doll, A. Fester, Bernd O. Kolbesen, T. Hackett, Mark Hoffman

Single Chemistry Cleaning with Complexing Agents (CAs): Determination of CA-Lifetimes by UV/VIS-Spectroscopy

Authors: O. Doll, Bernd O. Kolbesen

Complexing Agents Employed in Single Chemistry Cleaning: Stability Studies Using HPLC

Authors: S. Metzger, Bernd O. Kolbesen