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HomeSolid State PhenomenaSolid State Phenomena Vol. 92

Solid State Phenomena Vol. 92

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92

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Table of Contents

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Paper Title Page

Stability and Residue Studies of Complexing Agents in SC-1 Bath

Authors: Heini Saloniemi, Simo Eränen, Raimo A. Ketola, Juha Kokkonen, Sari Lehto, Kaija Luomanperä, Pertti Vastamäki, Heli Sirén, Olli Anttila

41

Single Wafer Immersion Process Incorporating a Novel Megasonics Configuration with an Advanced IPA Vapor Condensation Dry

Authors: J.J. Rosato, E.G. Baiya, J.A. Imonigie, M.R. Yalamanchili, E. Hansen

45

Metallic Contamination Removal Evaluation for Single Wafer Processing

Authors: Pieter Boelen, Steven Verhaverbeke, Philippe Garnier, Didier Levy, Hitoshi Morinaga

49

Procedure to Evaluate Particle-Substrate Interaction during Immersion in Liquid

Authors: Wim Fyen, J. Vansteenbergen, Kai Dong Xu, Rita Vos, Paul W. Mertens, Marc Heyns

53

Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System

Authors: Jennifer Baker, Christopher Beaudry, Hitoshi Morinaga, Steven Verhaverbeke

57

Investigating Post CMP Cleaning Processes for STI Ceria Slurries

Authors: Robert Small, Pascal Berar, Brandon Scott

63

Long-Term Effect of Transportation on Particle Concentrations in Various Process Chemicals

Authors: S.I. Misat, G. De Vos, G. Huysmans

69

A New Industrial Etching & Drying Process for MEMS to Prevent Collapse of Microstructures

Authors: O. Raccurt, F. Arnaud d'Avitaya, E. Charlaix, T. Vareine, F. Tardif

73

In Situ Symflow^TM Etching in an STG^® Dryer

Authors: Kurt K. Christenson, Nam Pyo Lee, Thomas J. Wagener, Steven L. Nelson

77

High Uniformity Wet Processing for Qxide Thinning and Polymer Cleaning Applications

Authors: Gerald Wagner, Kei Kinoshita, Reinhard Sellmer, Stefan Fichtl

81

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