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HomeSolid State PhenomenaSolid State Phenomena Vol. 92

Solid State Phenomena Vol. 92

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92

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Table of Contents

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Paper Title Page

Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films

Authors: Gerardo Montaño-Miranda, Anthony J. Muscat

207

Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon

Authors: Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, S. Petrović, David J. Monk, Ray Roop

211

Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?

Authors: F. De Smedt, H. Vankerckhoven, Stefan De Gendt, Marc Heyns, Chris Vinckier

215

New Residue Removal Method Using Ozonated Water with Phosphoric Acid

Authors: Izumi Oya, Makoto Miyamoto, Masaki Kuzumoto

219

Ozone-Gas Concentration Measurements for Photoresist Stripping

Authors: D. Martin Knotter, Miranda Marsman, Patrick Meeusen, Georg Gogg, Steve Nelson

223

Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process

Authors: Glenn W. Gale, Takayuki Toshima, Naoki Shindo, Tadashi Iino, Shigenori Kitahara, Keji Taguchi

227

Novel Photoresist Removal Using Atomic Hydrogen Generated by Heated Catalyzer

Authors: T. Miki, Akira Izumi, H. Matsumura

231

'Resist / Wet Etch' Couple for Dual Gate Oxide

Authors: Alessio Beverina, I. Guilmeau, J.P. Carrere, N. Emonet, F. Guyader, V. Huard, Sébastien Petitdidier, R. Velard

235

New Contact Cleaning in HF & N2/H2 Microwave Plasma

Authors: Y.B. Kim, Jeong Ho Kim, Yong Mann Lee, Gil Gwang Lee, Jung Yup Kim, Ja Chun Ku, Jae Ok Ryu

239

Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study

Authors: Simon Y.M. Chooi, Christopher Lim, Wen Jun Liu, Ping-Yu Ee

243

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