Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

227-230

DOI:

10.4028/www.scientific.net/SSP.92.227

Citation:

G. W. Gale et al., "Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process", Solid State Phenomena, Vol. 92, pp. 227-230, 2003

Online since:

May 2003

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$35.00

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