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HomeSolid State PhenomenaSolid State Phenomena Vol. 92'Resist / Wet Etch' Couple for Dual Gate Oxide

'Resist / Wet Etch' Couple for Dual Gate Oxide

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

235-238

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.235

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Online since:

May 2003

Authors:

Alessio Beverina, I. Guilmeau, J.P. Carrere, N. Emonet, F. Guyader, V. Huard, Sébastien Petitdidier, R. Velard

Keywords:

BOE, Etching, HF, Resist

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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