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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Cleaning after Contact Etching of Multi-Film Stack...

Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

243-246

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.243

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Online since:

May 2003

Authors:

Simon Y.M. Chooi, Christopher Lim, Wen Jun Liu, Ping-Yu Ee

Keywords:

Silicide, SPM, X-Ray Photoelectron Spectroscopy (XPS)

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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