Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

243-246

DOI:

10.4028/www.scientific.net/SSP.92.243

Citation:

S. Y.M. Chooi et al., "Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study", Solid State Phenomena, Vol. 92, pp. 243-246, 2003

Online since:

May 2003

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$35.00

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