Post Metal Etch Polymer Removal: A New CF4-Based Dry Plasma Process Sequence

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

255-258

DOI:

10.4028/www.scientific.net/SSP.92.255

Citation:

M. P. Pozzoli and S. Petroni, "Post Metal Etch Polymer Removal: A New CF4-Based Dry Plasma Process Sequence", Solid State Phenomena, Vol. 92, pp. 255-258, 2003

Online since:

May 2003

Export:

Price:

$35.00

In order to see related information, you need to Login.