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HomeSolid State PhenomenaSolid State Phenomena Vol. 92New Contact Cleaning in HF & N2/H2 Microwave...

New Contact Cleaning in HF & N2/H2 Microwave Plasma

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

239-242

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.239

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Online since:

May 2003

Authors:

Y.B. Kim, Jeong Ho Kim, Yong Mann Lee, Gil Gwang Lee, Jung Yup Kim, Ja Chun Ku, Jae Ok Ryu

Keywords:

Contact, Dry Cleaning, HF, NH₄HF₂, Plasma, Silicon Surface, X-Ray Photoelectron Spectroscopy (XPS)

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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