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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Ozone-Gas Concentration Measurements for...

Ozone-Gas Concentration Measurements for Photoresist Stripping

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Abstract:

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

223-226

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.223

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Online since:

May 2003

Authors:

D. Martin Knotter, Miranda Marsman, Patrick Meeusen, Georg Gogg, Steve Nelson

Keywords:

Oxidation Reaction, Ozone Concentration, Photoresist Removal

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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