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HomeSolid State PhenomenaSolid State Phenomena Vol. 92New Residue Removal Method Using Ozonated Water...

New Residue Removal Method Using Ozonated Water with Phosphoric Acid

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Abstract:

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

219-222

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.219

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Online since:

May 2003

Authors:

Izumi Oya, Makoto Miyamoto, Masaki Kuzumoto

Keywords:

Ozonated Water, Phosphoric Acid, Residue Removal

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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