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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Advanced Cylindrical Capacitor Formation Using...

Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

203-206

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.203

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Online since:

May 2003

Authors:

Ron Hanestad, Brent Schwab, Jeffery W. Butterbaugh, Kuntack Lee, Woo Gwan Shim, Sang Yong Kim, Yong Pil Han

Keywords:

Anhydrous HF, Capacitor, DRAM

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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