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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Defect-Free Si Thinning by In Situ HCI Vapour...

Defect-Free Si Thinning by In Situ HCI Vapour Etching

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

199-202

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.199

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Online since:

May 2003

Authors:

R. Loo, Matty Caymax, Olivier Richard, Peter Verheyen, Nadine Collaert

Keywords:

Epitaxial Growth, In Situ Vapour HCI Etch, Si Thinning

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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