Paper Titles

Wafer Surface Preparation Requirements for Next-Generation Devices
p.191

Cleaning of Si Surfaces by Lamp Illumination
p.195

Defect-Free Si Thinning by In Situ HCI Vapour Etching
p.199

Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching
p.203

Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films
p.207

Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon
p.211

Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?
p.215

New Residue Removal Method Using Ozonated Water with Phosphoric Acid
p.219

Ozone-Gas Concentration Measurements for Photoresist Stripping
p.223

HomeSolid State PhenomenaSolid State Phenomena Vol. 92Gas-Phase HF/Vapor Etching of Thermal Silicon...

Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films

Article Preview

Abstract:

You might also be interested in these eBooks

Ultra Clean Processing of Silicon Surfaces VI

Info:

Periodical:

Solid State Phenomena (Volume 92)

Pages:

207-210

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.207

Citation:

Cite this paper

Online since:

May 2003

Authors:

Gerardo Montaño-Miranda, Anthony J. Muscat

Keywords:

Dry Clean, FT-IR, HF/Vapour Etching, Silicon Dioxide

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2003 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: