Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

207-210

DOI:

10.4028/www.scientific.net/SSP.92.207

Citation:

G. Montaño-Miranda and A. Muscat, "Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films", Solid State Phenomena, Vol. 92, pp. 207-210, 2003

Online since:

May 2003

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$35.00

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