Alternative Post-Etch Polymer Removal in a Single-Wafer Platform

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

247-250

DOI:

10.4028/www.scientific.net/SSP.92.247

Citation:

C. Dundas et al., "Alternative Post-Etch Polymer Removal in a Single-Wafer Platform", Solid State Phenomena, Vol. 92, pp. 247-250, 2003

Online since:

May 2003

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$35.00

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